倾斜入射光散射式硅片表面缺陷检测仪

Tilt incident light scattering silicon wafer surface defect testing instrument

Abstract

The silicon wafer surface defect detecting instrument includes the following components: laser light source component, beam-expanding system formed from double-concave lens and plano-convex lens, double-balsaming focusing lens, plane reflector, working table, photoelectric detector and computer. Said invention also provides its working principle.
一种倾斜入射光散射式硅片表面缺陷检测仪,其构成是:在所述的激光光源组件发出的光束前进的方向上,依次有双凹透镜和平凸透镜组成的扩束系统,双胶合聚焦透镜,光束经平面反射镜转折且聚焦倾斜入射在被测量硅片表面,硅片位于工作台上;两块凸面相对的平凸透镜构成的散射光收集镜头对散射光进行收集,光电探测器置于所述的收集镜头的焦点处,光电探测器的输出端接计算机,在硅片的反射光方向上设有一光学陷阱。本发明具有检测精度高、结构简单、体积小、信噪比高等特点。

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    CN-101398393-BFebruary 02, 2011上海华虹Nec电子有限公司硅片制品缺陷分析方法及装置
    CN-101672801-BApril 06, 2011中国科学院上海光学精密机械研究所具有缺陷分类能力的硅片表面缺陷检测仪及缺陷分类方法